Plasma Enhanced Chemical Vapour Deposition

PECVD

The table can be used for a quick thickness estimation.

It is based on Si3N4 at a refractive index of 1.97 and SiO2 at 1.48.

In practice SiN is deposited at 1.80 - 2.25 and SiO at 1.46 - 1.52.

PECVD of Dielectrics