Plasma System Layouts
RIE: Reactive Ion Etching System
PE: Plasma/ Planar Etch system
RIE/PE configuration
ICP RIE: RIE with ICP source
PECVD: Plasma Deposition System
PECVD with frequency mixing
ICP PECVD: PECVD with ICP source
Ion Beam Etching/ Deposition System
Barrel for Resist Stripping
Sputtering System