PECVD technology

top electrode with high uniformity shower head

gas inlet top electrode with 13 MHz Generator and Automatch (AMU)

substrate electrode heated and grounded

System control: PLC (programmable logic controller) and PC 2000

Roots pump with dual stage rotary as backing pump

additional turbo optional

gate valve and APC (automatic pressure) control valve

pressure reading: CM gauge for process (Capacitance Manometer)

additional Penning for base pressure optional

gas pod with 6/ 12 MFC controlled gas lines (Mass Flow Controller)