ICP- RIE technology

ICP-remote RIE technology

ICP sources RF Generator and Automatch (AMU)

sources: ICP65, ICP180, ICP380

substrate electrode  with 13 MHz Generator and Automatch (AMU)

optional: heater/ chiller for the substrate electrode

Helium backside cooling and mechanical or e-chuck clamping

System control: PLC (programmable logic controller) and PC 2000

Turbomolecular pump with dual stage rotary as backing pump

gate valve and APC (automatic pressure) control valve

pressure reading: CM gauge for process (Capacitance Manometer)

Penning gauge for base pressure

gas pod with 6/ 12 MFC controlled gas lines (Mass Flow Controller)