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Plasma Technology | |
WHITE PAPERS
(2009) Si
/ deep Si Etching (1.4 MB)
(2009)
SiO2/ deep SiO2 Etching (1.2 MB)
(2010) ICP - PECVD
(0.8 MB)
(2010) Ion Beam
Deposition (0.3 MB)
(2010)
InP Etching (4 MB)
(2011)
Pt ALD (0.6 MB)
(2011)
Nanoscale Etching with ICP plasmas (1.5 MB)
(2011)
Al2O3 PECVD for solar cells (0.2 MB)
Posters 2011
Conformal
ALD layers grown with AAO templates and Carbon Nanotubes
by remote plasma and thermal ALD (3.6 MB)
Advances
in Large Batch Gallium Nitride Etching Process for
9th International Conference on Nitride Semiconductors (ICNS-9)
LED Production Solutions (1.2 MB)
Posters 2010
Preliminary
investigation of high-k materials (1.6 MB)
Nucleation
and growth of platinum films on high-kmetal (1.7 MB)
Temperature control of multiple
wafers during etching of 2” Sapphire wafers for Patterned Sapphire Substrates
(PSS) (1.4 MB)
Characterization
and comparison of fused silica etch processes in fluorocarbon based ICP chemistries
(1.7 MB)
Ion Beam Milling using SIMS monitoring/ control and
RIBE profile control of optoelectronic devices (3.7 MB)
Nano-scale Silicon Pattern Transfer Using
Cryogenic SF6/O2 Chemistry and Polymer Resist Masks (3 MB)
Posters 2008
SiN - SiO ALD (500 kB)
High quality patterns produced by nanoimprint lithography
and inductive coupled plasma etching (2.6 MB)
Silicon Etch Process Options
for Micro- and Nanotechnology using Inductively Coupled Plasmas (1.7 MB)
Choice of Silicon Etch Processes for Opto-
and Microelectronic Device Fabrication using Inductively Coupled Plasmas (900
kB)
Silicon Etch Process Options
for Micro- and Nanotechnology using Inductively Coupled Plasmas with AMO (1.5
MB)
May 2007
ICP
Etching Processes for Nanoimprint Lithograhy (146 kB)
plasma ALD of Al2O3, TiN,HfO2, Ru (625 kB)
Properties of low temperatures oxide films by remote plasma
ALD (304 kB)
New Advances in PECVD (178 kB)
MBE: Graded Base InGaP/InGaAs/GaAs HBT
growth with a GaP decomposition source (1.2 MB)
Aug 2006: remote plasma ALD introduction
introduction by by Erwin Kessels, TU
Eindhoven (600 kB)
introduction note by Steve Rossnagel, IBM (88
kB)
introduction note by Hyeongtag Jeon, Hanyang
University of Seoul (33 KB)
Plasma News May 2005 (225 kB)
incl abstracts of the following articles:
- Coatings for Diode Laser Bars (311 kB)
- PECVD of polysilicon (461 kB)
Plasma News January 2005 (215 kB)
incl abstracts of the following articles:
- Etching of CdHgTe (CMT) material using Inductively
Coupled Plasma (ICP) Systems (505 kB)
- Advances in PECVD processing (178 kB)
- MBE System Clusterlab 600 (237 kB)
Plasma News July 2004 (305 kB)
incl abstracts of the following articles:
- Plasma Etching - An Essential Tool for Failure Analysis
(355 kB)
- Recent improvements in ICP etching for MEMS and other
applications (172 kB)
- Molecular Beam Epitaxy: Applications and Equipment
(165 kB)
- Liquid Precursors for Silicon Dioxide PECVD (311 kB)
Plasma News January 2004 (329 kB)
incl abstracts of the following articles:
- Etching of III-V Materials using Inductively Coupled
Plasma (ICP) Systems (977 kB)
- Batch Plasma Processing of Gallium Nitride as a Production
Solution (364 kB)
- State of the Art End Point Detection Techniques for Compound
Semiconductors (241 kB)
- Low Temperature Deposition by ICP (198 kB)
- ICP Silicon Etch Processes for Photonic Crystals
(465 kB)
Plasma News October 2003 (256 kB)
incl abstracts of the following articles:
- Lens Etching for Photonic Applications (1275 kB)
- Polymer Etching for Passive Photonics (837 kB)
- Ion beam Etching and Reactive Ion beam etching
(1073 kB)
- High Rate SiO2 Etching for Passive Photonics (381
kB)
Plasma News July 2003 (250 kB)
incl abstracts of the following articles:
- PECVD for Passive Photonic Applications (96 kB)
- Ion Beam Deposition for High Quality Optics (73
kB)
- Versatile Magnetron Sputtering Solution (57 kB)