20 µm Bi₂Te₃ etched by ICP - RIE

one leg

Plasmalab System 100
with ICP380

rate > 20 µm/ hr
uniformity +/- 4 % over 100 mm
selectivity to PR > 1 : 1

MicroPelt Peltier coolers and MicroPelt thermogenerators
The manufacturing is performed using micro electronic techniques. Substrates are standard silicon/silicondioxide wafers. The thermoelectric Bi₂Te₃ related films are dry etched using the Plasmalab System 100 with ICP380.

with kind permission of
Infineon Technologies AG
Fraunhofer - IPM Freiburg
www.micropelt.com

ICP Technology