5 µm deep, anisotropic diamond
etch at 50 nm/ min

RIE with ICP source

OPT application lab:
10 µm deep, anisotropic diamond
etch at 500 nm/ min
The Ti mask was too thin and is eroded.

Plasmalab System 100
with ICP380 source

Reactive Ion Etching (RIE)

Plasmalab 80 Plus