OPT application lab:
Polyimide removed from a 300 mm wafer

Technology:
Parallel Plate Reactor
13.56 MHz - Plasma Excitation
RIE / PE changeover

Laser Interferometry can be used for
determining the end point.

RIE with
laser interferometer

Plasmalab 80 Plus (RIE)
with laser interferometer

OPT application lab:
Polyimide removed from a 200 mm wafer

Results:
Rate > 100 nm/ min
Selectivity to SiN > 15 : 1
Uniformity +/- 6 % (300 mm wafer)

Plasmalab 800 Plus
300mm Si wafer being processes