OPT application lab: lens tranferred from PR into GaP
Plasmalab System 100 with ICP380
By the ICP - RIE dry etch technology lens patterns can be transferred from photoresist into GaP.
rate > 1 µm/ min uniformity +/- 3 % over 100 mm selectivity GaP : PR adjustable process: Cl based surface: smooth
ICP Technology
