![]() |
Plasma Technology |
|
![]() |
The process of Ion beam sputter deposition produces sputtered atoms with high average energy. Films made from these atoms show improved properties and adhesion when compared to conventional deposition techniques such as evaporative or ion assisted deposition. A high quality optical coating should have the same optical thickness over a variety of conditions. Conventional deposited films have a porous microstructure making them moisture sensitive. When these films collect moisture (e.g. when exposed to air) the optical thickness of the film changes due to the difference between the refractive index of water and air. This causes a spectral shift in the reflectance or transmittance of the film. Ion beam sputtering produces films with a very densely packed surface structure reducing the sensitivity to moisture and resulting in little or no spectral shift. |
![]() |