248 µm diamter lenses
etched into Si

RIE technology

Plasmalab 80 Plus

Dr Eisner uses his Plasmalab RIE 80
System for Fluorine RIE processes as Si
or SiO₂ etching. For the lens etch process
the lens must first be created in
Photoresist and is then transferred by
anisotropic RIE into Si.

Application:
Coupling light into a monomode fiber
at a wavelength of 1318 nm

with kind permission of:
  University of Erlangen
  Institut fuer Angewandte Optik
  Dr Eisner

Si Lens Etching

The SEM's shows 248 µm diameter lenses.

rate: 50 - 250 nm/ min

selectivity to PR: 0.8 - 3 : 1

Uniformity  < ± 2  % (100 mm Si wafer)