Current density (A\ cm2) vs
electrical field (MV\ cm)

Capacitance (F) vs Voltage (V)

ICP - PECVD

   Plasmalab System 100 with ICP380

Technology:
PECVD
with ICP Source (2 or 13 MHz)
Inductive Coupled Plasma
RF driven substrate electrode

Results:
Rate: > 5 nm/ min
temperature < 120 deg C
lift off compatible
refractive index 1.46
breakdown voltage > 8 MV/ cm
uniformity < +/- 4 % ( 100 mm wafer with ICP 380)

Plasmalab 80 Plus
with ICP65