Mr Straub uses his Plasmalab 80 Plus RIE system for II/VI RIE processes as ZnSe etching with CH4/ H2 based process chemistry.
with kind permission of: University of Linz Institut fuer Halbleiterphysik Hr Straub
RIE technology
Plasmalab 80 Plus
The SEM's shows 100 nm lines and dots. rate: 15 - 25 nm/ min selectivity to PR 20 : 1 mask used here: Ti