Deposition Configuration

• target plate or cube
• 13.56 MHz driven 3 or 15 cm RF source
• filamentfree Plasma Bridge Neutraliser
• quartz Xtal monitor optional
• rotating target shields
• High Quality Optical Coatings:
  SiO2, TiO2, Ta2O5

Etching Configuration

• 13.56 MHz driven 3, 15 or 30 cm RF source
• filamentfree Plasma Bridge Neutraliser
• cooled substrate holder for up to 200 mm substrates
• Helium backside cooling
• shutter with integrated current monitor

General

• etch and deposition in one chamber
• vacuum loadlock
• Cassette loading station
• PC control with software under Windows™

-> show load sequence

with Cassette Loading and square transfer station