> 97 % uptime
ideal for heavily implanted resist
field proven production system
fully clean room compatible
through the wall installation
PC Plus control with software under Windows™
13 MHz, GHz preexcitation optional
20 - 40 min/ batch (1 µm PR)
small version: 100 x 4" or 50 x 6"
large version: 200 x 4" 100 x 5" 100 x 6"or 50 x 8"
isotropic SiN removal
Si etching for solar cells
surface cleaning
adhesion enhancement
