|
VG V 100 MBE system
for 4x4”, 5x3” or 12x2” wafer platens
Proven Process:
Thickness uniformity: < +/- 1%
AlxGa(1-x)As composition uniformity: < +/- 1% (of x)
Doping uniformity: < +/- 2.5%
Defects density (@ 0.9 mm) < 20/cm2
|
|
industry standard platform for production MBE
with >70% market share
Fully automated multi 4-inch wafer MBE reactor
with compact floor space
Extremely reliable production tool with proven real time
24 hour x 7 day operation at numerous customer sites
Best thickness uniformity (<+/- 1%) offered
by a multi 4-inch MBE reactor
Capable to handle 5x3” and 4x4” wafer platens
Ten (10) source ports for flexible configurations
Open bench style design of growth chamber for
easy access to source region and rapid egress
Optional demountable cryopanel for routine maintenance
(ideal for phosphorus recovery)
Growth chamber with external water-cooling
to minimize heat load
Dual Fast Entry Locks (FEL) for quick introduction and
retrieval of wafers from the system |
| Fully computer automated batch mode wafer operation
with minimal operator intervention
New source shutter with angled design to minimize
source materials drip back to furnaces
Magnetic couple shutter with no bellows – improve shutter reliability
Dual zone substrate heater design for optimal temperature uniformity
Standard outgassing stage in prep chamber with optional flash heating capability
Uni-axial sample transfer mechanism for maximum reliability and repeatability
Advanced Windows based MBE process control allow flexible recipe control
Additional ports in ellipsometry, atomic absorption
and other advanced in-situ monitoring techniques
Options:
Wide range of sources are available:
Patented ThermocellTM technology for Ga and In
High and Low Temperature Thermal effusion sources
Valved Cracker cells
GaP decomposition source for P2 generation
Injectors and control modules for Gaseous source materials
RF Plasma sources for atomic and radical generation
Proprietary Diffusion Pump technology equipped with LN2 cold trap (ideal for P handling and recovery and other high vapor pressure materials) |
|
VG Thermocell
Mean time between process calibrations is maximised
through optimal flux versus material depletion characteristic
Best uniformity and lowest defect levels
ThermoCell is best available solution for group III
Full enclosure bakeout, cleanest system
Highest productivity |
