SIMS

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Ionfab 300 Plus for dry etching:
IBE - RIBE - CAIBE


In secondary ion mass spectrometry (SIMS) an ion beam is directed
to a solid surface, removing material in the form of neutral and
ionized atoms and molecules. The secondary ions enter the mass
spectrometer and are separated according to their mass-to-charge ratio.

The SIMS is used to analyse the composition of sample material
e.g. once it measures a break through from one material to another,
it can be used to endpoint the process step.

 

 

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A Quadrupole Mass Spectrometer consists of four precisely aligned
metal rods to which are applied DC and RF voltages; this combination
acts like a filter that allows only ions of a single mass through.

By altering the voltages on the rods the Mass Spectrometer selects
the mass that can get through the filter, like tuning a radio to a
particular station.
The analyzer ( which contains the Quadrupole Mass filter )
and the RF head ( which supplies the RF and DC voltages )
are supplied as a matched pair. If the head is not matched
to the rods then the Mass Spectrometer will, literally,
not tune in properly.

 


SIMS head mounting at the substrate holder


with kind permission of Uni Kiel


with kind permission of TU Twente: sample size 1 cm x 1 cm
Ta(5nm)/Co(15nm)/Al2Ox(2.3nm)/Co(3.5nm)/FeMn(10nm)/Co(5nm)/Ta(5nm) /SiO2(2mm) (substrate)


with kind permission of Chalmers Uni Goeteborg